Heyns, MarcMarcHeynsMeuris, MarcMarcMeurisMertens, PaulPaulMertensSchmidt, HaraldHaraldSchmidtVerhaverbeke, StevenStevenVerhaverbekeBender, HugoHugoBenderVandervorst, WilfriedWilfriedVandervorstCaymax, MattyMattyCaymaxRotondaro, AntonioAntonioRotondaroHatcher, Z.Z.HatcherGräf, D.D.Gräf2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/197Ultra clean processing technology for highly reliable gate oxidesProceedings paper