Witters, LiesbethLiesbethWittersMitard, JeromeJeromeMitardVeloso, AnabelaAnabelaVelosoHikavyy, AndriyAndriyHikavyyFranco, JacopoJacopoFrancoKauerauf, ThomasThomasKaueraufCho, Moon JuMoon JuChoSchram, TomTomSchramSebaai, FaridFaridSebaaiYamaguchi, ShinpeiShinpeiYamaguchiTakeoka, S.S.TakeokaFukuda, MasahiroMasahiroFukudaWang, Wei-EWei-EWangDuriez, BlandineBlandineDuriezEneman, GeertGeertEnemanLoo, RogerRogerLooKellens, KristofKristofKellensTielens, HildeHildeTielensFavia, PaolaPaolaFaviaRohr, ErikaErikaRohrHellings, GeertGeertHellingsBender, HugoHugoBenderRoussel, PhilippePhilippeRousselCrabbe, YvoYvoCrabbeBrus, StephanStephanBrusMannaert, GeertGeertMannaertKubicek, StefanStefanKubicekDevriendt, KatiaKatiaDevriendtDe Meyer, KristinKristinDe MeyerRagnarsson, Lars-AkeLars-AkeRagnarssonSteegen, AnAnSteegenHoriguchi, NaotoNaotoHoriguchi2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20155Dual-channel technology with Cap-free single metal gate for high performance CMOS in gate-first and gate-last integrationProceedings paper