The relation between sodium and aluminum contamination and dielectric breakdown in MOS structures

Vermeire, BertBertVermeireRotondaro, AntonioAntonioRotondaroMertens, PaulPaulMertensVerhaverbeke, StevenStevenVerhaverbekeHeyns, MarcMarcHeyns2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/490The relation between sodium and aluminum contamination and dielectric breakdown in MOS structuresProceedings paper