Zhao, ChaoChaoZhaoPawlak, MalgorzataMalgorzataPawlakPopovici, Mihaela IoanaMihaela IoanaPopoviciSchaekers, MarcMarcSchaekersSleeckx, ErikErikSleeckxVancoille, EricEricVancoilleWouters, DirkDirkWoutersTokei, ZsoltZsoltTokeiKittl, JorgeJorgeKittl2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16605Atomic layer deposition of Ru and RuO2 for MIMCAP applicationsProceedings paper