Selective deposition of WS2 by a prepatterned dacrificial Si layer

Heyne, MarkusMarkusHeyneDelabie, AnneliesAnneliesDelabieCaymax, MattyMattyCaymaxRadu, IulianaIulianaRadude Marneffe, Jean-FrancoisJean-Francoisde MarneffeDe Gendt, StefanStefanDe Gendt2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26723Selective deposition of WS2 by a prepatterned dacrificial Si layerOral presentation