Varela Pedreira, OlallaOlallaVarela PedreiraZahedmanesh, HoumanHoumanZahedmaneshCiofi, IvanIvanCiofiTokei, ZsoltZsoltTokeiCroes, KristofKristofCroes2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/34329Electromigration scaling limits of copper interconnectsProceedings paper