Van Den Heuvel, DieterDieterVan Den HeuvelJonckheere, RikRikJonckheereCheng, ShauneeShauneeChengMarcuccilli, GinoGinoMarcuccilliCross, AndrewAndrewCrossInderhees, GregGregInderheesParisi, PaoloPaoloParisi2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21689Investigation of the performance of state-of-the-art defect inspection tools within EUV lithographyProceedings paper