Study of mask error enhancement factor improvement with low-n absorber extreme ultraviolet lithography mask

Takahata, YosukeYosukeTakahataKovalevich, TatianaTatianaKovalevichDe Simone, DaniloDaniloDe SimoneTanaka, YusukeYusukeTanakaPhilipsen, VickyVickyPhilipsen2025-08-252025-01-092025-08-2520241932-5150WOS:001389147600002https://imec-publications.be/handle/20.500.12860/45053Study of mask error enhancement factor improvement with low-n absorber extreme ultraviolet lithography maskJournal article10.1117/1.JMM.23.4.044401WOS:001389147600002