Batan, AABatanFranquet, AlexisAlexisFranquetVereecken, JeanJeanVereeckenReniers, FrancoisFrancoisReniers2021-10-172021-10-1720080142-2421https://imec-publications.be/handle/20.500.12860/13347Characterisation of the silicon nitride thin films deposited by plasmamagnetronJournal article