Heyns, MarcMarcHeynsMeuris, MarcMarcMeurisVerhaverbeke, StevenStevenVerhaverbekeMertens, PaulPaulMertensSchmidt, HaraldHaraldSchmidtRotondaro, AntonioAntonioRotondaroHurd, TraceTraceHurdHatcher, Z.Z.HatcherGräf, D.D.Gräf2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/198Cleaning technology for highly reliable gate oxidesProceedings paper