Precise optical constants: determination and impact on metrology, simulation and development of EUV masks

Saadeh, QaisQaisSaadehMesilhy, HazemHazemMesilhySoltwisch, VictorVictorSoltwischErdmann, AndreasAndreasErdmannCiesielski, RichardRichardCiesielskiLohr, LeonhardLeonhardLohrAndrle, AnnaAnnaAndrlePhilipsen, VickyVickyPhilipsenThakare, DeveshDeveshThakareLaubis, ChristianChristianLaubisScholze, FrankFrankScholzeKolbe, MichaelMichaelKolbe2023-06-082023-02-152023-02-162023-06-0820220277-786XWOS:000905312400032https://imec-publications.be/handle/20.500.12860/41098Precise optical constants: determination and impact on metrology, simulation and development of EUV masksProceedings paper10.1117/12.2643246978-1-5106-5642-0WOS:000905312400032EXTREME-ULTRAVIOLETREFRACTIVE-INDEXDIFFRACTIONREFLECTIONSCATTERINGphotomaskMask 3D effectsEUV lithography, high NA, computational lithography, EUV masks, EUV absorber materials