The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach

Tiwari, AtulAtulTiwariFallica, RobertoRobertoFallicaAckermann, Marcelo D.Marcelo D.AckermannMakhotkin, Igor A.Igor A.Makhotkin2024-08-202024-06-152024-08-202024978-1-5106-7216-10277-786XWOS:001224296200002https://imec-publications.be/handle/20.500.12860/44049The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approachProceedings paper10.1117/12.3010917978-1-5106-7217-8WOS:001224296200002RESIST