Statistical characterization of a high-K metal gate 32nm ARM926 core under process variability impact

Zuber, PaulPaulZuberDobrovolny, PetrPetrDobrovolnyLaabidi, SelmaSelmaLaabidiJaverliac, VirgileVirgileJaverliacLaplanche, YvesYvesLaplancheMiranda Corbalan, MiguelMiguelMiranda Corbalan2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20238Statistical characterization of a high-K metal gate 32nm ARM926 core under process variability impactOral presentation