Erdmann, AndreasAndreasErdmannEvanschitzky, PeterPeterEvanschitzkyXu, DongboDongboXuLuong, VuVuLuongPhilipsen, VickyVickyPhilipsenHendrickx, EricEricHendrickx2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26604Exploration of alternative absorber materials for EUV lithography: A simulation studyProceedings paper