Feasability of TiSi2 and CoSi2 for sub quarter micron processes

Vanhaelemeersch, SergeSergeVanhaelemeerschBaklanov, MikhaïlMikhaïlBaklanovMaex, KarenKarenMaex2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1605Feasability of TiSi2 and CoSi2 for sub quarter micron processesOral presentation