Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar Plasmas

Li, JieJieLiKundu, ShreyaShreyaKunduSouriau, LaurentLaurentSouriauBezard, PhilippePhilippeBezardIzmailov, RomanRomanIzmailovLazzarino, FredericFredericLazzarino2025-05-062024-10-302025-05-0620251612-8850WOS:001337985500001https://imec-publications.be/handle/20.500.12860/44700Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar PlasmasJournal article10.1002/ppap.202400186WOS:001337985500001GALLIUM-ZINC-OXIDECARBONDEPOSITIONRADICALSSILICON