Zhao, ChaoChaoZhaoWitters, ThomasThomasWittersBreimer, P.P.BreimerMaes, JanJanMaesCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe Gendt2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13269Properties of ALD HfTaxOy high-k layers deposited on chemical silicon oxideJournal article