Nicholas, GarethGarethNicholasGrasby, T.J.T.J.GrasbyFulgoni, D.J.F.D.J.F.FulgoniBeer, C.S.C.S.BeerParsons, J.J.ParsonsMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12620High mobility strained Ge pMOSFETs with high-k/metal gateJournal article