Inhomogeneous Charge Carrier Density in Wafer-Scale MoS<sub>2</sub> Caused by Locally Varying Substrate Doping

Myja, HenrikHenrikMyjaAbdelbaky, MohamedMohamedAbdelbakyUstenko, SofiiaSofiiaUstenkoKumar, PawanPawanKumarGroven, BenjaminBenjaminGrovenMedina Silva, HenryHenryMedina SilvaMorin, PierrePierreMorinMertin, WolfgangWolfgangMertinKümmell, TilmarTilmarKümmellBacher, GerdGerdBacher2026-07-242026-07-2420261944-82441944-8252https://imec-publications.be/handle/20.500.12860/59975engInhomogeneous Charge Carrier Density in Wafer-Scale MoS<sub>2</sub> Caused by Locally Varying Substrate DopingJournal article10.1021/acsami.6c00562WOS:001732093000001SURFACE-MORPHOLOGYLAYER MOS2GROWTHFILMSPHOTOLUMINESCENCETRANSITIONTRIONSMEDLINE:419182491944-8252