Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing

Dussart, R.R.DussartLefaucheux, P.P.LefaucheuxTillocher, T.T.TillocherRanson, P.P.RansonBoufnichel, M.M.BoufnichelLjazouli, R.R.LjazouliZhang, LipingLipingZhangMankelevich, Y.Y.Mankelevichde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22295Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturingMeeting abstract