Soft X-Ray Absorption Spectroscopy Investigation of HfO2 and ZrO2 Thin Films with Modulated Crystalline Phase by Varying Dopants (Al, Si, Gd) for Ferroelectric and High-k Dielectric Applications

Kim, Hyun-CheolHyun-CheolKimPopovici, Mihaela IoanaMihaela IoanaPopoviciHerrero-Martin, JavierJavierHerrero-MartinMeersschaut, JohanJohanMeersschautDekkers, HaroldHaroldDekkersKwon, Dae SeonDae SeonKwonVan Houdt, JanJanVan Houdt2025-03-142025-03-142025-MAR 61862-6254WOS:001438578200001https://imec-publications.be/handle/20.500.12860/45396Soft X-Ray Absorption Spectroscopy Investigation of HfO2 and ZrO2 Thin Films with Modulated Crystalline Phase by Varying Dopants (Al, Si, Gd) for Ferroelectric and High-k Dielectric ApplicationsJournal article10.1002/pssr.202400385WOS:001438578200001