Vos, IngridIngridVosHellin, DavidDavidHellinDemuynck, StevenStevenDemuynckRichard, OlivierOlivierRichardConard, ThierryThierryConardVertommen, JohanJohanVertommenBoullart, WernerWernerBoullart2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13201A novel concept for contact etch residue removalProceedings paper