Philipsen, VickyVickyPhilipsenFrommhold, AndreasAndreasFrommholdThakare, DeveshDeveshThakareLibeert, GuillaumeGuillaumeLibeertLee, InhwanInhwanLeeFranke, Joern-HolgerJoern-HolgerFrankeBekaert, JoostJoostBekaertVan Look, LieveLieveVan LookPellens, NickNickPellensDe Bisschop, PeterPeterDe BisschopJonckheere, RikRikJonckheereKovalevich, TatianaTatianaKovalevichWiaux, VincentVincentWiauxHendrickx, EricEricHendrickx2025-07-032024-04-252025-07-0320240021-4922WOS:001204915300001https://imec-publications.be/handle/20.500.12860/43875Mask innovations on the eve of high NA EUV lithographyJournal article review10.35848/1347-4065/ad38c7WOS:001204915300001