A wafer-scaled III-V vertical FET fabrication by means of plasma etching

Milenin, AlexeyAlexeyMileninVeloso, AnabelaAnabelaVelosoCollaert, NadineNadineCollaertPiumi, DanieleDanielePiumi2021-10-252021-10-2520180167-9317https://imec-publications.be/handle/20.500.12860/31344A wafer-scaled III-V vertical FET fabrication by means of plasma etchingJournal articlehttps://authors.elsevier.com/a/1WXUqcBkcQdF5