Improvement of PECVD silicon–germanium crystallization for CMOS compatible MEMS applications

Guo, BinBinGuoSeveri, SimoneSimoneSeveriBryce, GeorgeGeorgeBryceClaes, GertGertClaesVan Hoof, RitaRitaVan HoofDu Bois, BertBertDu BoisHaspeslagh, LucLucHaspeslaghWitvrouw, AnnAnnWitvrouwDecoutere, StefaanStefaanDecoutere2021-10-182021-10-1820100013-4651https://imec-publications.be/handle/20.500.12860/17200Improvement of PECVD silicon–germanium crystallization for CMOS compatible MEMS applicationsJournal article