Schram, TomTomSchramKubicek, StefanStefanKubicekRohr, ErikaErikaRohrBrus, StephanStephanBrusVrancken, ChristaChristaVranckenChang, Shou-ZenShou-ZenChangChang, V.S.V.S.ChangMitsuhashi, RiichiruRiichiruMitsuhashiOkuno, YasutoshiYasutoshiOkunoAkheyar, AmalAmalAkheyarCho, Hag-JuHag-JuChoHooker, J.C.J.C.HookerParaschiv, VasileVasileParaschivVos, RitaRitaVosSebaai, FaridFaridSebaaiErcken, MoniqueMoniqueErckenKelkar, PrasadPrasadKelkarDelabie, AnneliesAnneliesDelabieAdelmann, ChristophChristophAdelmannWitters, ThomasThomasWittersRagnarsson, Lars-AkeLars-AkeRagnarssonKerner, ChristophChristophKernerChiarella, ThomasThomasChiarellaAoulaiche, MarcMarcAoulaicheCho, Moon JuMoon JuChoKauerauf, ThomasThomasKaueraufDe Meyer, KristinKristinDe MeyerLauwers, AnneAnneLauwersHoffmann, Thomas Y.Thomas Y.HoffmannAbsil, PhilippePhilippeAbsilBiesemans, SergeSergeBiesemans2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14441Novel process to pattern selectively dual dielectric capping layers using soft-mask onlyProceedings paper