Vaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheidYounkin, ToddToddYounkinWinroth, GustafGustafWinrothBiafore, JohnJohnBiaforeAnno, YusukeYusukeAnnoHoshiko, KenjiKenjiHoshikoConstantoudis, VassiliosVassiliosConstantoudis2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23210Roughness and variability in EUV lithography: Who is to blame? (Part 1)Proceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1675310