Adelmann, ChristophChristophAdelmannDelabie, AnneliesAnneliesDelabieSchepers, BartBartSchepersRodriguez, LeonardLeonardRodriguezFranquet, AlexisAlexisFranquetConard, ThierryThierryConardOpsomer, KarlKarlOpsomerVaesen, IngeIngeVaesenMoussa, AlainAlainMoussaPourtois, GeoffreyGeoffreyPourtoisPierloot, ChristineChristinePierlootCaymax, MattyMattyCaymaxVan Elshocht, SvenSvenVan Elshocht2021-10-202021-10-2020120948-1907https://imec-publications.be/handle/20.500.12860/20255Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursorsJournal article