Updates on Ge AND SiGe CMP processes for integration as high mobility channel materials

Ong, PatrickPatrickOngTeugels, LieveLieveTeugelsAnsar, SheikhSheikhAnsarDelande, TinneTinneDelandeBhonsle, RithuRithuBhonsleSiebert, MaxMaxSiebertLeunissen, LeonardusLeonardusLeunissen2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25707Updates on Ge AND SiGe CMP processes for integration as high mobility channel materialsMeeting abstract