Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)

Rezvani, JavidJavidRezvaniTchoudinov, GeorghiiGeorghiiTchoudinovNannarone, StefanoStefanoNannaroneFallica, RobertoRobertoFallica2022-05-062022-04-152022-05-062022-03-17https://imec-publications.be/handle/20.500.12860/39628Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)Oral presentationApplied physics