Rectification of extreme ultraviolet lithography patterns by directed self-assembly: a roughness and defectivity study

Van Bel, JulieJulieVan BelVerstraete, LanderLanderVerstraeteSuh, Hyo SeonHyo SeonSuhBezard, PhilippePhilippeBezardMoussa, AlainAlainMoussaSantos, AndreiaAndreiaSantosHer, YoungjunYoungjunHerDe Gendt, StefanStefanDe Gendt2025-07-032025-01-092025-07-0320241932-5150WOS:001389147600017https://imec-publications.be/handle/20.500.12860/45054Rectification of extreme ultraviolet lithography patterns by directed self-assembly: a roughness and defectivity studyJournal article10.1117/1.JMM.23.4.043001WOS:001389147600017DIMENSIONS