Characterization of modification of 193-nm photoresist by HBr plasma

Vereecke, GuyGuyVereeckeClaes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeKesters, ElsElsKestersStruyf, HerbertHerbertStruyfCarleer, RobertRobertCarleerAdriaensens, PeterPeterAdriaensens2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20056Characterization of modification of 193-nm photoresist by HBr plasmaMeeting abstracthttp://www.pesm2011.be/Pesm2011/Program_Friday.html