Erdmann, AndreasAndreasErdmannShao, FengFengShaoEvanschitzky, PeterPeterEvanschitzkyFuehner, TimTimFuehnerLorusso, GianGianLorussoHendrickx, EricEricHendrickxGoethals, MiekeMiekeGoethalsJonckheere, RikRikJonckheereBret, TristanTristanBretHofmann, ThorstenThorstenHofmann2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18889Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effectsProceedings paper