Characterization of CF3I for low-k material etching

Samara, VladimirVladimirSamaraPorter, StephenStephenPorterde Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanov2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23033Characterization of CF3I for low-k material etchingMeeting abstract