Scalability of strained nitride capping layers for future CMOS generations

Eneman, GeertGeertEnemanJurczak, GosiaGosiaJurczakVerheyen, PeterPeterVerheyenHoffmann, Thomas Y.Thomas Y.HoffmannDe Keersgieter, AnAnDe KeersgieterDe Meyer, KristinKristinDe Meyer2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10426Scalability of strained nitride capping layers for future CMOS generationsProceedings paper