Basic aspects of the formation and activation of boron junctions using plasma immersion ion implantation

Zschaetzsch, GerdGerdZschaetzschVandervorst, WilfriedWilfriedVandervorstHoffmann, ThomasThomasHoffmannGoossens, JozefienJozefienGoossensEveraert, Jean-LucJean-LucEveraertdel Agua Borniquel, Jose IgnacioJose Ignaciodel Agua BorniquelPoon, T.T.Poon2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14855Basic aspects of the formation and activation of boron junctions using plasma immersion ion implantationProceedings paper