Swerts, JohanJohanSwertsSiew, Yong KongYong KongSiewVan Besien, ElsElsVan BesienBarbarin, YohanYohanBarbarinOpsomer, KarlKarlOpsomerBoemmels, JuergenJuergenBoemmelsTokei, ZsoltZsoltTokeiVan Elshocht, SvenSvenVan Elshocht2021-10-222021-10-2220140167-9317https://imec-publications.be/handle/20.500.12860/24581Scalability of RuTiN barriers deposited by plasma-enhanced atomic layer deposition for advanced interconnectsJournal articlehttp://www.sciencedirect.com/science/article/pii/S0167931713005911