EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm

Tan, Ling EeLing EeTanGillijns, WernerWernerGillijnsLee, Jae UkJae UkLeeXu, DongboDongboXuVan de Kerkhove, JeroenJeroenVan de KerkhovePhilipsen, VickyVickyPhilipsenKim, Ryan Ryoung HanRyan Ryoung HanKim2022-09-292022-09-192022-09-262022-09-292022-05-26978-1-5106-4977-40277-786XWOS:000850450900022https://imec-publications.be/handle/20.500.12860/40459EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nmProceedings paper10.1117/12.2614000978-1-5106-4978-1WOS:000850450900022