SEM based overlay measurement between resist and buried patterns

Inoue, OsamuOsamuInoueOkagawa, YutakaYutakaOkagawaHasumi, KazuhisaKazuhisaHasumiShao, ChuanyuChuanyuShaoLeray, PhilippePhilippeLerayHalder, SandipSandipHalderLorusso, GianGianLorussoBaudemprez, BartBartBaudemprez2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26767SEM based overlay measurement between resist and buried patternsProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2518881&resultClick=1