Failure mechanisms of PVD Ta and ALD TaN barrier layers for Cu contact applications

Zhao, ChaoChaoZhaoTokei, ZsoltZsoltTokeiHaider, A.A.HaiderDemuynck, StevenStevenDemuynck2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13268Failure mechanisms of PVD Ta and ALD TaN barrier layers for Cu contact applicationsJournal article