Yuan, Xiao JieXiao JieYuanVan den Bosch, GeertGeertVan den BoschLietaer, NicolasNicolasLietaerZagrebnov, MaximMaximZagrebnovDebusschere, IngridIngridDebusschereDeferm, LudoLudoDeferm2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3166Analysis of plasma induced gate oxide damage in multi-level metal processingProceedings paper