In-line electrical metrology for high-k gate dielectrics deposited by atomic layer chemical vapour deposition

De Witte, HildeHildeDe WitteMaes, JanJanMaesPassefort, S.S.PassefortBesling, W.W.BeslingEason, K.K.EasonYoung, E.E.YoungRittersma, ChrisChrisRittersmaHeyns, MarcMarcHeyns2021-10-142021-10-142002-09https://imec-publications.be/handle/20.500.12860/6227In-line electrical metrology for high-k gate dielectrics deposited by atomic layer chemical vapour depositionJournal article