Superior electrostatic control in uniform monolayer MoS2 scaled transistors via in-situ surface smoothening

Shi, YuanyuanYuanyuanShiGroven, BenjaminBenjaminGrovenSmets, QuentinQuentinSmetsSutar, SurajitSurajitSutarBanerjee, SreetamaSreetamaBanerjeeMedina, HenryHenryMedinaWu, XiangyuXiangyuWuHuyghebaert, CedricCedricHuyghebaertBrems, StevenStevenBremsLin, DennisDennisLinMorin, PierrePierreMorinCaymax, MattyMattyCaymaxAsselberghs, IngeIngeAsselberghsRadu, IulianaIulianaRadu2022-09-202022-07-092022-09-2020212380-9248WOS:000812325400177https://imec-publications.be/handle/20.500.12860/40078Superior electrostatic control in uniform monolayer MoS2 scaled transistors via in-situ surface smootheningProceedings paper10.1109/IEDM19574.2021.9720676978-1-6654-2572-8WOS:000812325400177