Newly developed positive-tone resists for Posi/Posi double patterning process

Nakamura, TsuyoshiTsuyoshiNakamuraTakeshita, MasaruMasaruTakeshitaMaemori, SatoshiSatoshiMaemoriUchida, RyusukeRyusukeUchidaTakasu, RyoichiRyoichiTakasuOhmori, KatsumiKatsumiOhmori2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/15912Newly developed positive-tone resists for Posi/Posi double patterning processProceedings paper