Optimization of EUV reticle cleaning by evaluation of chemistries on wafer-based mimic test structures.

Pacco, AntoineAntoinePaccoDattilo, DavideDavideDattiloJonckheere, RikRikJonckheereRip, JensJensRipDietze, UweUweDietzeKruemberg, JensJensKruembergHolsteyns, FrankFrankHolsteyns2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27105Optimization of EUV reticle cleaning by evaluation of chemistries on wafer-based mimic test structures.Proceedings paper