Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials

Wu, ChenChenWuLi, YunlongYunlongLiLesniewska, AlicjaAlicjaLesniewskaVarela Pedreira, OlallaOlallaVarela Pedreirade Marneffe, Jean-FrancoisJean-Francoisde MarneffeCiofi, IvanIvanCiofiVerdonck, PatrickPatrickVerdonckBaklanov, MikhaïlMikhaïlBaklanovBoemmels, JuergenJuergenBoemmelsDe Wolf, IngridIngridDe WolfTokei, ZsoltZsoltTokeiCroes, KristofKristofCroes2021-10-232021-10-2320150021-8979https://imec-publications.be/handle/20.500.12860/26189Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materialsJournal articlehttp://scitation.aip.org/content/aip/journal/jap/118/16/10.1063/1.4934520