Depth profiling of ZrO2/SiO2/Si stacks - a TOF-SIMS and computer simulation study

Ignatova, V.A.V.A.IgnatovaConard, ThierryThierryConardMoller, W.W.MollerVandervorst, WilfriedWilfriedVandervorstGijbels, R.R.Gijbels2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9086Depth profiling of ZrO2/SiO2/Si stacks - a TOF-SIMS and computer simulation studyJournal article