Fullerene based materials for ultra-low-k application

Broczkowska, KatarzynaKatarzynaBroczkowskaKlocek, JolantaJolantaKlocekFriedrich, DanielDanielFriedrichKolanek, KrzysztofKrzysztofKolanekUrbanowicz, AdamAdamUrbanowiczScheisser, DieterDieterScheisserMiller, MiroslawMiroslawMillerZschech, EhrenfriedEhrenfriedZschech2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/16803Fullerene based materials for ultra-low-k applicationProceedings paperhttp://www-old.wemif.pwr.wroc.pl/optoel/workshop2010/