Self-assembled monolayers as ALD Ru growth inhibitor in an area-selective bottom-up metallization scheme

Zyulkov, IvanIvanZyulkovMadhiwala, VirajVirajMadhiwalaDe Gendt, StefanStefanDe GendtArmini, SilviaSilviaArmini2021-10-282021-10-282019https://imec-publications.be/handle/20.500.12860/34559Self-assembled monolayers as ALD Ru growth inhibitor in an area-selective bottom-up metallization schemeMeeting abstract