Nohira, HiroshiHiroshiNohiraTsai, WilmanWilmanTsaiBesling, WimWimBeslingYoung, EdwardEdwardYoungPétry, JasmineJasminePétryConard, ThierryThierryConardVandervorst, WilfriedWilfriedVandervorstDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsMaes, JosJosMaesTuominen, MarkoMarkoTuominen2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6649Characterisation of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopyJournal article